Menguelti, K. : rechercher sur Z-Library

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1

Revisiting the mechanisms involved in Line Width Roughness smoothing of 193 nm photoresist patterns during HBr plasma treatment

Brihoum, M., Ramos, R., Menguelti, K., Cunge, G., Pargon, E., Joubert, O.

Journal:

Journal of Applied Physics

Année:

2013

Langue:

english

Fichier:

PDF, 1.18 MB

english, 2013

2

Controlling electrical and optical properties of zinc oxide thin films grown by thermal atomic layer deposition with oxygen gas

Nguyen, Tai, Adjeroud, Noureddine, Guennou, Mael, Guillot, JÃ©rÃ´me, Fleming, Yves, Papon, Anne-Marie, Arl, Didier, Menguelti, Kevin, Joly, Raoul, Gambacorti, Narciso, Polesel-Maris, JÃ©rÃ´me

Journal:

Results in Materials

Année:

2020

Fichier:

PDF, 20.70 MB

2020

3

Benefits of plasma treatments on critical dimension control and line width roughness transfer during gate patterning

Azarnouche, Laurent, Pargon, Erwine, Menguelti, Kevin, Fouchier, Marc, Joubert, Olivier, Gouraud, Pascal, Verove, Christophe

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Année:

2013

Langue:

english

Fichier:

PDF, 2.16 MB

english, 2013

4

HBr Plasma Treatment Versus VUV Light Treatment to Improve 193 nm Photoresist Pattern Linewidth Roughness

Erwine Pargon, Laurent Azarnouche, Marc Fouchier, Kevin Menguelti, Raluca Tiron, Claire Sourd, Olivier Joubert

Journal:

Plasma Processes and Polymers

Année:

2011

Langue:

english

Fichier:

PDF, 609 KB

english, 2011

5

Vacuum ultra violet absorption spectroscopy of 193 nm photoresists

M. Fouchier, E. Pargon, L. Azarnouche, K. Menguelti, O. Joubert, T. Cardolaccia, Y. C. Bae

Journal:

Applied Physics A: Materials Science & Processing

Année:

2011

Langue:

english

Fichier:

PDF, 844 KB

english, 2011

6

Unbiased line width roughness measurements with critical dimension scanning electron microscopy and critical dimension atomic force microscopy

Azarnouche, L., Pargon, E., Menguelti, K., Fouchier, M., Fuard, D., Gouraud, P., Verove, C., Joubert, O.

Journal:

Journal of Applied Physics

Année:

2012

Langue:

english

Fichier:

PDF, 1.31 MB

english, 2012

7

Plasma treatments to improve line-width roughness during gate patterning

Azarnouche, Laurent, Pargon, Erwine, Menguelti, Kevin, Fouchier, Marc, Brihoum, Mélisa, Ramos, Raphael, Joubert, Olivier, Gouraud, Pascal, Verove, Christophe

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2013

Langue:

english

Fichier:

PDF, 1.87 MB

english, 2013

8

Polymeric cantilevered piezotronic strain microsensors processed by Atomic Layer Deposition

Joly, Raoul, Girod, StÃ©phanie, Adjeroud, Noureddine, Nguyen, Tai, Grysan, Patrick, Klein, SÃ©bastien, Menguelti, Kevin, Vergne, ChristÃ¨le, Polesel-Maris, JÃ©rÃ´me

Journal:

Sensors and Actuators A: Physical

Année:

2020

Fichier:

PDF, 175 KB

2020

9

Molecular layer deposition of amine-containing alucone thin films

Bahlawane, Naoufal, Arl, Didier, Thomann, Jean-Sébastien, Adjeroud, Noureddine, Menguelti, Kevin, Lenoble, Damien

Journal:

Surface and Coatings Technology

Année:

2013

Langue:

english

Fichier:

PDF, 546 KB

english, 2013

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - Plasma treatment to improve linewidth roughness during gate patterning

Azarnouche, L., Pargon, E., Menguelti, K., Fouchier, M., Brihoum, M., Ramos, R., Joubert, O., Gouraud, P., Verove, C., Zhang, Ying

Année:

2012

Langue:

english

Fichier:

PDF, 1.34 MB

english, 2012

11

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

Pargon, E., Menguelti, K., Martin, M., Bazin, A., Chaix-Pluchery, O., Sourd, C., Derrough, S., Lill, T., Joubert, O.

Journal:

Journal of Applied Physics

Année:

2009

Langue:

english

Fichier:

PDF, 689 KB

english, 2009

12

Smoothing mechanisms involved in thermal treatment for linewidth roughness reduction of 193-nm photoresist patterns

Pargon, Erwine, Azarnouche, Laurent, Fouchier, Marc, Menguelti, Kevin, Jussot, Julien

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Année:

2013

Langue:

english

Fichier:

PDF, 2.75 MB

english, 2013

13

Plasma impact on 193 nm photoresist linewidth roughness: Role of plasma vacuum ultraviolet light

Pargon, E., Martin, M., Menguelti, K., Azarnouche, L., Foucher, J., Joubert, O.

Journal:

Applied Physics Letters

Année:

2009

Langue:

english

Fichier:

PDF, 460 KB

english, 2009

14

One step deposition of PEDOT films by Plasma Radicals Assisted Polymerization via Chemical Vapor Deposition

Pistillo, Bianca Rita, Menguelti, Kevin, Desbenoit, Nicolas, Arl, Didier, Leturcq, Renaud, Ishchenko, Olga, Kunat, Martin, Baumann, Peter, Lenoble, Damien

Journal:

Journal of Materials Chemistry C

Année:

2016

Langue:

english

Fichier:

PDF, 1.80 MB

english, 2016

15

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - A CD AFM study of the plasma impact on 193nm photoresist LWR: role of plasma UV and ions

Pargon, E., Allgair, John A., Raymond, Christopher J., Martin, M., Menguelti, K., Azarnouche, L., Foucher, J., Joubert, O.

Année:

2009

Langue:

english

Fichier:

PDF, 562 KB

english, 2009

16

PRAP-CVD: how to design high conformal PEDOT surfaces

Pistillo, B. R., Menguelti, K., Arl, D., Addiego, F., Lenoble, D.

Journal:

Année:

2017

Langue:

english

Fichier:

PDF, 975 KB

english, 2017